Nanotechnology: A Maker’s Course All Weeks Practice Quiz Answer

Let’s go over Coursera Course Nanotechnology: A Maker’s Course Week 1 Practice Quiz Answer.

Week 1 Practice Quiz Answer

 
 

Practice Quiz for Introduction


Question 1)
Which of the following are types of information we can get from a nano-measurement tool?
  • Hardness
  • Elemental/Chemical Composition
  • Size
  • Geometry
 
 
Question 2)
An optical microscope uses light to produce an image, whereas an electron microscope uses _____________.
 
Enter answer here
 
 
 
Question 3)
If you needed to measure the length of DNA, what type of measurement tool can you use?
  • Optical Microscope
  • Ruler
  • Tape measure
  • Electron Microscope
 
 
Question 4)
Which of the following are typically conductive? Select all that apply
  • Biologicals
  • Gold
  • Dielectrics/Ceramics
  • Polymers
  • Silver
  • Metal
 
 
Question 5)
Lasers are only used in high-tech nanotechnology facilities – but not my home. 
  • True
  • False
 
 
Question 6)
The photolithography technique mentioned in the Introduction to Nanofabrication Tools can produce features as small as:
  • one nanometer
  • one angstrom
  • a couple of microns wide
  • meters
 
 
Question 7)
Particles in the open air can cause defects in thin film deposition 
  • True
  • False
 

Practice Quiz for Essential Technologies for Nano

 
Question 1)
In the cleanroom demonstration video, the cameraman did not need to gown up in order to enter the cleanroom.
  • True
  • False
 
 
Question 2)
When preparing to enter the cleanroom, shoe covers are put on before the hood.
  • True
  • False
 
 
Question 3)
Which of the following has more air molecules inside (per unit volume)?
  • Cleanroom
  • Vacuum
 
 
 
Question 4)
_______________ is a measurement of gas molecules in a vacuum chamber
 
  • Temperature
  • Atomic Mass
  • Pressure
  • Length
 
 
Question 5)
Which of the following are found in the electromagnetic spectrum?
(Select all that apply)
  • X-Ray
  • Sound
  • Seismic wave
  • Beta Ray
  • Infrared 
 
 
Question 6)
What is the best resolution of a microscope with a numerical aperture of 0.12 using energy with a wavelength of 400 nm?
  • 200.0 nm
  • 2.0 microns
  • 3.3 nm
  • 3.3 microns
 
 
Question 7)
As the velocity of an electron changes from 2.3*10^8 m/s to 1.6*10^8 m/s the wavelength of the electron will ________.
  • stay the same
  • decrease
  • increase
 
 
Question 8)
What can occur when an electron beam interacts with a sample? (Select all that apply)
  • Electrons in the beam will change color as they hit the
    sample.
  • Electrons in the beam will gain mass as they hit the sample.
  • Electrons in the beam will scatter in the sample and exit the
    sample
  • Electrons in the beam will knock electrons out of the sample
  • X-rays will be produced
 
 
Question 9)
What is the best resolution of a microscope with a numerical aperture of 0.5 using energy with a wavelength of 1.2 pm?
  • 1.44 nm
  • 1.44 pm
  • 2.4 nm
  • 2.4 pm
Question 10)
As the wavelength of an electron decreases, the electron travels _________.
  • faster
  • slower
  • the same speed
 
Question 11)
What can occur when an electron beam interacts with a sample? (Select all that apply)
  • The beam will create a vacuum.
  • The beam will pass through the sample
  • Electrons in the beam will become trapped in the sample
  • The beam will create a hologram image of the sample.
  • Electrons in the beam will multiply as they hit the sample
 
 
Question 12)
When preparing to enter the cleanroom, we put on gloves first or last?
  • First
  • Last
 
 
Question 13)
Which of the following are found in the electromagnetic spectrum?
(Select all that apply)
  • Gamma rays
  • Time wave
  • Visible Light
  • Alpha ray
  • Echo wave
 
Question 14)
As the velocity of an electron decreases the wavelength of the electron will ________.
  • stay the same
  • decrease
  • increase

 

 

Week 2 Quiz Answer

 
Let’s go over Coursera Course on Nanotechnology: A Maker’s Course Week 2 Quiz | Nano Measurement and Characterization Tools: Scanning Electron Microscopy and Energy-Dispersive X-ray Spectroscopy Answers.
 

 

Question 1)
What is an advantage of using an environmental scanning electron
microscope?
  • Wet samples can be imaged in their natural state without being
    dried.
  • Samples can be coated with less expensive metals to prevent
    charging.
  • Images can be collected much more rapidly.
  • The resolution is typically higher than traditional SEM.
 
Question 2
Which of the following statements are true? (Select all that apply)
  • Both secondary electron and backscattered SEM images provide useful
    information.
  • The contrast that we see in a backscatter image is due to differences
    in electron velocity as it interacts with the sample.
  • Secondary electron images look very 3 dimensional.
  • Secondary electron images provide information microns within a
    sample.
 
Question 3
Which of the following uses electrons to generate images?
  • Light microscope
  • Electron microscope
 
Question 4)
In SEM, which of the following materials is often used to coat
nonconductive samples?
  • Acetone
  • Glass
  • Carbon
  • Polymer
 
Question 5)
In SEM, after loading the sample and pumping the chamber to a low pressure, what is the first thing that should be done before collecting an image?
  • Coat the sample with a conductive layer.
  • Move the sample out of the chamber.
  • Focus the electron beam on the sample.
  • Tighten the set screws on the sample stage.
 
Question 6)
Which of the following information can be obtained through Energy Dispersive X-Ray Spectroscopy? (Select all that apply)
  • Chemical Composition
  • Elemental Composition
  • Mass
  • Weight
  • Feature Size
 
 
Question 7)
What is the critical electron-beam interaction that emits a characteristic x-ray from a sample in Energy Dispersive X-Ray
Spectroscopy (EDS)?
  • Electrons bombarding the sample
  • Electron dropping to a lower energy state
  • Electrons ejected from the sample
  • Atoms thermally vibrating in the sample
 
 
Question 8)
If an insulating sample is coated with a very small layer of gold to produce better images, gold will not be detected in the Energy
Dispersive X-Ray Microscopy (EDS) experiment.
  • True
  • False
 
 
Question 2)
If you are interested in collecting SEM images that highlight surface features of your sample, which detector would be more appropriate?
  • Backscatter
  • Secondary electron
 
 
Question 3)
Which of the following can achieve higher resolution?
  • Light microscope
  • Electron microscope
Question 4)
Why should nonconductive samples be coated with a conductive layer in traditional SEM?
  • To prevent sample damage
  • To obtain 3D images
  • To prevent charging
  • To decrease electron velocity
 
 
Question 5)
When using an SEM, stigmation is adjusted on the microscope to ensure that imaging is done with a _______ beam of electrons.
  • rectangular
  • triangular
  • concave
  • round
 
 
Question 4)
In SEM, what is the sample mounted on to prepare for imaging?
  • A gold plate
  • A glass slide
  • A piece of paper
  • A sample stub
Question 7)
What makes each element have a unique fingerprint in Energy Dispersive Spectroscopy (EDS)? 
    • Atomic number of elements in the sample
    • Electron energy states in the element
    • Amount of atoms in the sample
    • Mass of the atoms in the sample

 

Week 3 Quiz Answer

 
We will discuss Coursera Course Nanotechnology: A Maker’s Course Week 3 Quiz | Nano Measurement and Characterization Tools: Transmission Electron Microscopy Answers.
 

 

Question 1)
What is the major difference between SEM and TEM?
  • TEM uses smaller electrons than SEMs
  • Insulating samples can only be imaged in SEMs
  • Only TEM produces images of the sample
  • The electrons must pass through the sample in TEM
Question 2)
What are challenges of TEM? (Select all that apply)
  • Environment around the microscope must be precisely
    controlled
  • Aberrations related to lenses limit spatial resolution
  • Requires ultrathin samples
  • Sample image is a projection from 3D to 2D
Question 3)
In TEM, small changes in the environment, like vibrations from someone
talking or a slight increase in temperature do not affect imaging.
  • True
  • False
Question 4)
Using TEM, a researcher is able to image individual atoms.
  • True
  • False
Question 5)
Why does a TEM grid have pores? (Select the best answer)
  • To support atomic diffusion
  • To enable electron transmission
  • To enhance conductivity
  • To prevent charging
Question 6)
Plunge freezing is a sample preparation method used for Cryo-TEM in
which the sample is slowly cooled down.
  • True. The sample should be frozen gradually.
  • False. The sample should be cooled very rapidly.
Question 7)
Which is not a type of ice that can form at atmospheric pressure?
  • cubic
  • vitreous
  • hexagonal
  • octagonal
Question 8)
When performing biological sample prep for the TEM, which is not
required safety equipment?
  • lab coat
  • safety glasses
  • ear plugs
  • gloves
Question 9)
The inside of the TEM is always under vacuum?
  • True
  • False
Question 10)
What does a plasma cleaner do to a TEM sample?
  • Removes debris and other particulates
  • Coats the sample with a thin, clean layer of material
  • Washes the sample with detergent
  • Coats the sample with a conductive layer
Question 11)
When preparing samples for TEM imaging, an Ultra Microtome is used to
do what?
  • Slice the sample into thin sections
  • Chemically fix the sample
  • Dehydrate the sample
  • Freeze the sample
Question 12)
Using TEM, a researcher is unable to resolve individual atoms.
  • True
  • False
Question 13)
Which of the following help maintain a controlled environment for TEM
imaging?
  • Thick concrete walls
  • Radiative cooling panels
  • Floating tables
  • All of the above
Question 14)
In TEM, small changes in the environment, like vibrations from someone talking or a slight increase in temperature can affect imaging dramatically.
  • True
  • False
Question 15)
An acceptable TEM thin section sample thickness would be?
  • 70 to 90 nanometers
  • 70 to 90 micrometers
  • 7 to 9 micrometers
Question 16)
In general, samples should be less than ____  in order to be electron transparent?
    • 1500 nm
    • 150 nm
    • 150 um
    • 150 mm

 

Week 4 Quiz Answer

 
Here you will find Coursera Course Nanotechnology: A Maker’s Course Week 4 Quiz Answer | Nano Measurement and Characterization Tools: X-ray and Optical Characterization Answers.

 

 
Question 1)
What happens when x-rays hit a very dense part of the sample?
  • They are stopped or absorbed by it
  • They are reflected backward
  • They pass through it
 
 
Question 2)
Any specimen smaller than an adult human can fit and be scanned with a MicroCT?
  • True
  • False
 
Question 3)
Which of the following can be done with the final z-stack of images produced by the MicroCT?
  • It can be used to create 3D models that can be 3D printed.
  • It can be measured directly using free software like ImageJ
  • It can be animated to show off the internal or external structure of
    the specimen
  • All of the above
 
Question 4)
Using XPS you can obtain information about the chemistry of your sample’s ______.
  • a. bulk
  • b. surface
  • c. both a and b
  • d. none of the above
 
Question 5)
Electrons in a neutral/uncharged atom typically have _____ binding energies than electrons in an atom with a 4+ oxidation state.
  • higher
  • lower
 
 
Question 6)
Why are gloves worn during XPS sample preparation? (Select the best answer)
  • To protect the user from the instrument’s X-rays
  • To protect the user from the sample holder’s charge
  • To protect the sample from user contamination
  • To keep the user’s hands dry
 
Question 7)
On the x-axis of an XPS plot is binding energy. What does this axis represent?
  • The amount of energy needed to bind two atoms together
  • The amount of energy necessary to break bonds in a molecule
  • The X-ray energy produced by the X-ray gun
  • The amount of energy required to remove electrons from an atom
Question 8)
What can XPS  tell us about a sample? (Select all that apply)
  • The elements present in the bulk
  • The oxidation state of elements on the surface
  • The surface topography
  • The percentage of specific elements on the surface
 
Question 9)
The way light scatters or reflects depends on the size of an object.
  • True
  • False
 
Question 10)
Why might taking a scattering spectrum of nanoparticles take longer than taking a spectra of a bulk material?
  • Bulk materials scatter light more quickly
  • Bulk materials scatter light at higher energy
  • Nanoparticles are small and scatter less light
  • Nanoparticles scatter more light that is unfocused and cannot be
    collected
 
Question 11)
Why might the spectrum of particles, like nanorods, that are long and thin have two peaks compared to that of round particles, which have one peak? (Select the best answer)
  • There are twice as many long and thin particles as round
    particles
  • The long and thin particles are broken in half during the spectra
    collection generating two peaks
  • Round particles are bigger and thus have one large peak
  • The long and thin particles have two different dimensions that
    scatter light at different wavelengths
 
Question 2)
In order to stabilize a sample for scanning it may be necessary to wrap it up before placing it on the stage.  What would be the best
material to package a sample in before running the MicroCT?
  • Light plastic bottle filled with cotton
  • Fill in container with cement to hold specimen firmly
  • Stabilize with metal wire
  • Dense plastic tube filled with tinfoil
 
 
Question 6)
Why are tweezers used during XPS sample preparation? (Select the best answer)
  • To protect the user as the sample is heated
  • To prevent sample contamination
  • To enable better sample conductivity
  • To help thin the sample prior to analysis
 
 
Question 7)
On the y-axis of an XPS plot is “Intensity”. What does this axis
represent?
  • The sample depth
  • The intensity of light produced by the XPS machine
  • The number of electrons leaving the sample
  • The number of molecules present on the sample surface
 
Question 2
When prepping a sample for the MicroCT you often have to damage it in some way to get the best possible image.
  • True
  • False

 

 
Question 4)
What type of information does XPS give about the surface of a sample?
  • Roughness
  • Topography
  • Elastic modulus
  • Color
  • Chemistry

 

 Question 5)
Electrons farther away from an atom’s nucleus typically have ______ binding energies than electrons closer to the nucleus.
  • higher
  • lower

 

Question 8)
What can XPS  tell us about a sample? (Select all that apply)
  • The crystal structure of the sample
  • What other elements surface atoms are bound to
  • The oxidation state of elements in the bulk
  • The percentage of specific elements in the bulk

 

 
Question 9)
Which of the following can happen to light when it hits matter? (Select all that apply)
  • It will create a vacuum
  • It will be reflected
  • It will be scattered
  • It will gain energy
Question 11)
As the nanoparticle size changes, the peaks in the scattering spectra remain at the same wavelength.
  • True
  • False
Question 12)
As the nanoparticle size changes, the peaks in the scattering spectra shift to different wavelengths.
  • True
  • False

 

 

Week 5 Quiz Answer

 
Let’s share with you Coursera Course Nanotechnology: A Maker’s Course Week 5 Quiz Answer | Nanofabrication: Vacuum Pumps and Thin Film Vacuum Deposition Answers.

 

 
Question 1)
The turbo-molecular pump, or simply turbopump, is an example of what
type of pump:
  • a high vacuum pump
  • a rough pump
  • a low vacuum pump
 
Question 2)
Why do the cooling fins in a cryopump have a large surface area?
  • Large surface area reduces the noise of the pump.
  • Large surface area reduces vibrations.
  • Larger surface area provides more room for trapping air molecules,
    which improves pumping.
 
Question 3)
A cryopump will eventually become saturated with air molecules and
pumping efficiency will degrade.
  • True.  A saturated cryopump must undergo a process called
    regeneration to remove trapped air molecules and regain its original
    pumping efficiency.
  • False. A cryopump can pump indefinitely and will never become
    saturated with air molecules.
 
Question 4)
Why is a vacuum chamber typically kept under vacuum when not in use?
  • It is quieter
  • It keeps the chamber cleaner than leaving it filled with air
  • It saves electricity
 
Question 5)
Why do we often use a tungsten boat to hold gold during thermal
evaporation?
  • Tungsten has a higher melting temperature than gold
  • Tungsten has a lower melting temperature than gold
  • Tungsten is denser than gold
  • Tungsten is more electrically conductive than gold
 
Question 6)
It is necessary to rough pump a vacuum chamber before pumping with a
high vacuum pump.
  • True
  • False
 
Question 7)
A cryo-pump is a:
  • rough vacuum pump
  • high vacuum pump
  • water pump
 
Question 8)
In sputter deposition, the function of the plasma is to:
  • generate energetic atoms that remove target material
  • produce light to improve visibility in the vacuum chamber
  • heat the target
  • cool the target
 
Question 9)
During sputter deposition, increasing or decreasing sputter power too
quickly can cause the target material to crack.
  • True
  • False
 
 
Question 10)
In order to open a vacuum chamber that is at low pressure, you must
first do what?
  • Vent the chamber
  • Pump down the chamber
  • Fill the chamber with water

 

 
Question 11)
E-Beam evaporation heats the source material using:
  • Fire
  • a laser
  • a high voltage electron beam

 

 
Question 12)
It is impossible to know how much gold is deposited during thermal evaporation.
  • True. You must wait until deposition is complete to know the film thickness.
  • False. The thickness monitor indicates deposited thickness in real time.

 

 

 

Question 13)
A cryo-pump is used in combination with a rough pump to achieve high vacuum.
    • True
    • False

 

Week 6 Quiz Answer

 
In this article you will find  Coursera Course Nanotechnology: A Maker’s Course Week 6 Quiz Answer | Nanofabrication: Vapor Deposition Answers.

 

 
Question 1)
Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) are both thin film deposition techniques
  • True
  • False
 
Question 2)
Which of the following are properties that can be added to a substrate with a thin film?
  • Electrical Properties
  • Barrier Properties
  • Physical Properties
  • All of the above
 
Question 3)
Which of the following statements are true about the differences between Atomic Layer Deposition & Chemical Vapor Deposition.? (Check all that apply)
  • ALD takes less time than CVD.
  • CVD processes can grow thicker films at faster rates.
  • ALD does not involve chemical interactions.
  • ALD can be done at lower temperatures than CVD. 
  • ALD films are more conformal.
  • CVD does not require a substrate.
 
Question 4)
What types of  substrates can be treated with Atomic Layer
Deposition? 
  • Glass Slides
  • Silicon Wafers
  • Biological Samples
  • Polymers
  • All of the above
 
Question 5)
What types of substrates can be treated with Chemical Layer
Deposition?
 
  • Glass Slides
  • Silicon Wafers
  • Biological Samples
  • Polymers
  • All of the above
 
Question 6)
Which of the following are properties that can be added to a substrate
with a thin film?
  • Electrical Properties
  • Barrier Properties
  • Physical Properties
  • All of the above
 
Question 7)
In Chemical Vapor Deposition, like any vacuum deposition process, why are the chambers kept under vacuum even when not in use? (Please select the best answer)
  • To keep contaminants from accumulating inside the chamber
  • To prevent unauthorized use of equipment
  • To save energy
  • To comply with federal law
 
 
Question 8)
Solid, liquid and gas are three states of matter. PECVD utilizes a fourth state of matter called:
  • steam
  • plasma
  • vapor
 
Question 9)
The plasma in the PECVD chamber is formed using:
  • RF (radio frequency) electrical power
  • a heated wire filament
  • a laser
 
 
Question 10)
In a PECVD system, the necessary activation energy that drives the chemical processes comes from the plasma.  In non-plasma CVD
processes, the activation energy is provided by:
  • high pressure
  • high temperature / heat
  • ultrasonic agitation

    Week 7 Quiz Answer

     
In this article we will practice  Coursera Course Nanotechnology: A Maker’s Course Week 7 Quiz Answer | Nanofabrication: Patterning and Self-Assembly Answers.

 

Nanofabrication: Patterning and Self-Assembly

 

Question 1)
When performing photolithography, the photoresist is intended to be a permanent or a temporary layer?
  • Temporary
  • Permanent
 
 
Question 2)
Why is there special colored lighting in the photolithography room?
  • It improves your vision
  • To save electricity
  • To protect the light-sensitive photoresist 
 
 
Question 3)
During photolithography, the process of illuminating the wafer with UV light is termed:
  • spin coating
  • exposure
  • development
  • baking
 
 
Question 4)
In photolithography, the development step comes before or after exposure?
  • Before
  • After
 
 
Question 5)
When discussing EBL, the term “EBL resist” is best described as:
  • an electron sensitive polymer
  • a pressure sensitive polymer
  • a light sensitive polymer
 
 
Question 6)
When performing photolithography, we use chemical resists that are sensitive to light.  When performing electron beam lithography, we
use chemical resists that are sensitive to what?
  • Electrons
  • Pressure
  • Temperature
 
 
Question 7)
Why must the EBL chamber be under vacuum?
  • To reduce the noise generated by the EBL instrument
  • Because air would interfere with the electron beam
  • Because air would degrade the polymer film on the wafer
 
 
Question 8)
Electron beam lithography can pattern features so small that they cannot be adequately imaged using an optical microscope.
  • True
  • False
 
 
Question 9)
Ion beams can be used for all of the following, except: 
  • Imaging
  • Ion Implantation (Doping)
  • Patterning – Sputtering, Etching, & Milling
  • Welding 
 
 
Question 10)
To generate a beam of positively charged Gallium ions, a ______ charged electrical field is needed to accelerate positively-charged Gallium ions. (Select one)
  • negatively
  • neutrally
  • positively
 
 
Question 11)
In hot embossing, why is it important to wear gloves when handling the master mold? (Select one)
  • Fingerprints and particles from hands can transfer from the mold to
    the substrate
  • The mold is made of hazardous material
  • The mold is too hot to touch when loading into the embosser
 
 
Question 12)
In hot embossing, a master mold is used to imprint a pattern onto a softer substrate material. The master mold is typically much more
expensive than the materials it is used to emboss on.
  • True
  • False
 
 
Question 13)
There are four main steps in typical hot embossing processes. Select choice where the steps are listed in correct order.
  • Embossing, Heating, Demolding, Cooling
  • Demolding, Heating, Embossing, Cooling
  • Cooling, Heating, Demolding, Embossing
  • Heating, Embossing, Cooling, Demolding
 
 
Question 14)
In hot embossing, why is it important to wear gloves when handling the master mold? (Select one)
  • Fingerprints and particles from hands can transfer from the mold to
    the substrate
  • The mold is made of hazardous material
  • The mold is too hot to touch when loading into the embosser
 
 
Question 15)
Self-assembly can only be achieved through intra-molecular forces, such as ionic and covalent bonds.
  • True
  • False
 
Question 16)
Much like photolithography, electron beam lithography requires a mask that contains the pattern we want to transfer to our substrate.
  • True
  • False

Week 8 Quiz Answer

 
In this article you will find Coursera Course Nanotechnology: A Maker’s Course Week 8 Quiz Answer | Nanofabrication: Etching Answers.

 

Nanofabrication: Etching

  
Question 1)
In general, etching ________ material ____ a substrate. (Select the best answer)
  • removes, from
  • patterns, on 
  • combines with, on
  • adds, to
 
Question 2)
What is the etch rate?
  • The rate of reaction between two materials on the substrate
  • The rate at which material is removed
  • The time it takes to complete the etching process
  • The rate at which material is deposited onto the mask
 
 
Question 3)
When etch selectivity is high it means:
  • the etch rates of the mask and underlying substrate are high compared
    to the etch rate(s) of undesired material(s)
  • the etch rates of all materials in the system are high
  • the etch rates of the mask and underlying substrate are low compared
    to the etch rate(s) of undesired material(s)
  • the etch rates of all materials in the system are equal
 
 
Question 4)
In which of the following scenarios would the etch selectivity be low?
(Select all that apply)
  • The etch rates of the mask and underlying substrate are high
    compared to the etch rate(s) of undesired material(s)
  • The etch rates of all materials in the system are high
  • The etch rates of the mask and underlying substrate are low compared
    to the etch rate(s) of undesired material(s)
  • The etch rates of all materials in the system are low
  • The etch rates of all materials in the system are equal
 
 
Question 5)
During wet etching, etching is due to
  • Ion beam patterning
  • a chemical reaction between the reactant/etchant and materials in
    the system
  • physical removal of material
  • a chemical reaction between the mask material and the
    substrate
 
 
Question 6)
Which of the following describes the majority of wet etching
processes?
  • Anisotropic and non-selective
  • Isotropic and non-selective
  • Anisotropic and selective
  • Isotropic and selective
 
 
Question 7)
Which of the following are advantages of the wet etching process?
(Select all that apply)
  • It is easy to finely control the etch process
  • The reactions are typically anisotropic
  • The chemical consumption is low
  • The process is simple
  • It is easy to batch process multiple substrates/wafers
  • The reactions are selective
 
 
Question 8)
Which of the following are disadvantages of the wet etching process?
(Select all that apply)
  • It is difficult to finely control the etch process
  • The reactions are not selective
  • It is difficult to batch process multiple substrates/wafers
  • The process is complex
 
 
Question 9)
Which of the following personal protective equipment should be worn
during a standard wet etching process? (Select all that apply)
  • Self-contained breathing apparatus
  • Ear plugs
  • Chemically resistant gloves
  • Steel-toed boots
  • Face shield
  • Helmet
  • Chemical apron
 
 
Question 10)
To perform the wet etch, wafers are ____________. (Select the best
answer)
  • placed in a spin-rinse dryer and rinsed with etchant
  • placed in a vacuum chamber with reactive gases
  • sprayed with chemical etchant in a fume hood
  • submerged in a bath of chemical etchant
 
 
Question 11)
After etching, why is it important to do characterization of the
wafer?
  • To build new structures on the substrate
  • To confirm and evaluate the etching process
  • To continue etching in places that were not etched
  • To clean the wafer
 
 
Question 12)
What can cause the etching event in dry etching?
  • Chemical process
  • Physical process
  • All of the above
 
 
Question 13)
To obtain anisotropic and highly selective conditions in dry etching,
________ (Select the best answer)
  • the plasma etching is followed by thin film deposition.
  • the wafers are submerged in liquid nitrogen.
  • the plasma etching is followed by wet etching.
  • chemical and physical processes can be combined.
 
 
Question 14)
Which of the following are advantages of the dry etching process?
(Select all that apply)
  • Simple equipment
  • Easy to etch multiple wafers
  • Inexpensive
  • Chemical consumption is low
  • Process can be finely controlled
  • Selective and anisotropic etches possible
  • Ability to make intricate features
 
 
Question 15)
Which of the following are disadvantages of the dry etching process?
(Select all that apply)
  • Batch processing difficult
  • Requires complex equipment
  • Expensive
  • Small geometries are difficult
  • Process is difficult to control
  • Chemical consumption is high
  • Isotropic reactions
 
 
Question 16)
Which of the following parameters can be controlled by the user through
the etching software in the “recipe”? (Select all that apply)
  • Wafer material
  • Chamber pressure
  • Thin film deposition
  • Gas flow rate
 
 
Question 16)
Which of the following parameters can be controlled by the user
through the etching software in the “recipe”? (Select all that
apply)
  • Etching pattern
  • Mask material
  • Reaction temperature
  • Power
  • Chamber volume

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